Features | The sputtering head can be tilted +/- 25 degrees for adjusting the incidence angle of bombardments to improve the sputtering yield. Made of high-quality materials of stainless steel and ceramics. Electromagnetic finite element calculations are used in the design of the permanent magnetic assembly to achieve high field strength and uniform field profile. The magnet is coated with protective material against cooling water corrosion to maximize durability. Standard RF connector, which matches with a wide range of DC and RF sputtering power supplies. The low impedance sputtering heads are easily interfaceable with an external power supply. Easy to install a standard fitting with included quick connector 2" Copper Backing Plate (EQ-CBP-2) is included. Target replacement is easy and no need to adjust the gun to fit targets with different height.
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Power Requirement | DC (Max.) 500 W RF (Max.) 300 W
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Electrical Connection Type | |
Sputtering Current (Max.) | 5 Amp |
Sputtering Voltage | 200-1000 V |
Sputtering Pressure | 1-1000 mTorr |
Dimensions | |
Sputtering Target
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Cooling Water Requirement
| Flow Rate: 0.8 GPM, filtered Water Inlet Temperature: <20 C Water tubing: 6mm quick disconnect.
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Mounting | |
Net Weight | 3.5 lbs |
Accessories
| High vacuum Quick connector with 0.75" ID is included. Use this component to install the sputtering source onto the baseplate (up to 1” thick) of a vacuum chamber with 1” diameter through-hole at easy ( click pic below left to see detail ) 6" CF flange with a high vacuum feedthrough is available upon request at extra cost. The sputtering head can be easily installed on the 6'' CF vacuum flange through the quick disconnector. The height position of the sputtering gun can be manually adjusted inside the vacuum chamber. ( Pls click Pic below 3 &4 to see detail ) Digital Temperature Controlled circulating Water Chiller with 6 Liters Tank, 16L / min Flow is available at extra cost, please click the picture below right to order.
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