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The High-Power DC Power Supply for Magnetron Sputtering Coater is a precision-controlled energy source designed for continuous and pulsed DC sputtering applications. It provides consistent and smooth output to achieve high-quality thin film deposition for semiconductors, MEMS, and research laboratories.
With high conversion efficiency, ultra-low ripple, and comprehensive protection functions, this DC supply supports both single and multi-cathode sputtering systems, delivering superior coating uniformity and long target lifetime.
| Parameter | Specification | Description |
|---|---|---|
| Output Power | 3 kW – 60 kW | Optional power levels to meet various system requirements |
| Output Voltage | 0 – 1200 V DC (Adjustable) | Wide voltage range for different target materials |
| Output Current | 0 – 100 A (Adjustable) | High current for large-area sputtering |
| Output Ripple | ≤ 0.1% | Ensures stable plasma and uniform film thickness |
| Control Mode | Voltage / Current / Power | Flexible control options |
| Protection | Over-voltage, Over-current, Over-temperature, Short-circuit | Comprehensive safety protection |
| Cooling Method | Air / Water cooling | Efficient heat dissipation for long-term use |
| Interface | Analog / RS-485 / Ethernet (optional) | Supports automation and remote monitoring |
| Dimensions | Customized | Compact, rack-mount or standalone configurations |
Custom power ranges and configurations available upon request.
Advanced PWM control ensures stable DC output with minimal ripple, maintaining consistent plasma conditions during coating.
Adopts high-frequency soft-switching technology with power conversion efficiency over 90%, reducing energy loss and heat generation.
Built-in protection against over-voltage, over-current, and overheating guarantees safety and reliability in 24/7 industrial use.
Suitable for DC magnetron sputtering, pulsed sputtering, and other PVD systems. Compatible with a wide range of targets and chambers.
Equipped with digital and analog control options, supporting computer communication via RS-485 or Ethernet, and allowing for process data logging and remote diagnostics.
Compact structure with modular layout allows easy maintenance and integration into existing sputtering systems.
This high-power DC supply is ideal for various thin-film deposition applications, including:
Semiconductor manufacturing – metal and dielectric film deposition
Optical coatings – high-uniformity thin films for lenses and filters
MEMS fabrication – sputtering of gold, titanium, or aluminum layers
Surface engineering – coatings for wear, corrosion, or conductivity
Scientific research – materials science and nanotechnology laboratories
Compatible with CoaterFilm magnetron sputtering coaters and custom vacuum systems.
Mounting Options: Standard 19" rack or custom cabinet
Power Input: AC 380V ±10%, three-phase, 50/60Hz
Connection Interface: Plug-and-play with standard sputtering cathodes
Cooling: Forced air or water circulation; ensure proper ventilation
Environment: Operating temperature 0–40°C, humidity ≤80%
Follow the user manual for grounding and shielding to prevent electrical noise interference.
Ensure all connections are properly grounded before operation.
Gradually increase output power to reach the required coating level.
Periodically check cables, fans, and water cooling lines.
Clean the power unit exterior and ensure unobstructed airflow.
In case of fault or alarm, refer to the troubleshooting guide or contact technical support.
Models range from 3 kW up to 60 kW, depending on your sputtering system requirements.
Yes, optional modules allow for pulsed DC operation for advanced thin-film applications.
Over-current, over-voltage, over-temperature, and short-circuit protection are all standard.
Yes, CoaterFilm offers custom voltage, current, and communication interface configurations.
Standard warranty is 12 months, with lifetime technical support available.
Over 15 years of experience in sputtering and vacuum coating systems
High reliability and proven performance in global research institutions
Professional technical team for custom design and on-site support
Fast delivery and flexible OEM/ODM service
ISO-certified production and quality assurance
CoaterFilm is your trusted partner for precision thin-film equipment and power solutions.
XYZ University Materials Lab – 10 kW DC supply integrated with dual-cathode sputtering coater, improved deposition rate by 25%.
OptoTech Inc. – High-power 40 kW unit used in optical coating line, 24/7 operation with zero failure in 18 months.
(More application cases available upon request.)
Warranty: 12 months standard coverage
Technical Support: 24/7 email assistance and remote diagnostics
Spare Parts: In-stock components for fast replacement
Manuals & Resources: Download detailed datasheets and operation manuals
CoaterFilm Vacuum Technology Co., Ltd.
Leading manufacturer of vacuum coating equipment and sputtering systems.
ISO 9001 certified, CE-approved power supply series.
The High-Power DC Power Supply for Magnetron Sputtering Coater is a precision-controlled energy source designed for continuous and pulsed DC sputtering applications. It provides consistent and smooth output to achieve high-quality thin film deposition for semiconductors, MEMS, and research laboratories.
With high conversion efficiency, ultra-low ripple, and comprehensive protection functions, this DC supply supports both single and multi-cathode sputtering systems, delivering superior coating uniformity and long target lifetime.
| Parameter | Specification | Description |
|---|---|---|
| Output Power | 3 kW – 60 kW | Optional power levels to meet various system requirements |
| Output Voltage | 0 – 1200 V DC (Adjustable) | Wide voltage range for different target materials |
| Output Current | 0 – 100 A (Adjustable) | High current for large-area sputtering |
| Output Ripple | ≤ 0.1% | Ensures stable plasma and uniform film thickness |
| Control Mode | Voltage / Current / Power | Flexible control options |
| Protection | Over-voltage, Over-current, Over-temperature, Short-circuit | Comprehensive safety protection |
| Cooling Method | Air / Water cooling | Efficient heat dissipation for long-term use |
| Interface | Analog / RS-485 / Ethernet (optional) | Supports automation and remote monitoring |
| Dimensions | Customized | Compact, rack-mount or standalone configurations |
Custom power ranges and configurations available upon request.
Advanced PWM control ensures stable DC output with minimal ripple, maintaining consistent plasma conditions during coating.
Adopts high-frequency soft-switching technology with power conversion efficiency over 90%, reducing energy loss and heat generation.
Built-in protection against over-voltage, over-current, and overheating guarantees safety and reliability in 24/7 industrial use.
Suitable for DC magnetron sputtering, pulsed sputtering, and other PVD systems. Compatible with a wide range of targets and chambers.
Equipped with digital and analog control options, supporting computer communication via RS-485 or Ethernet, and allowing for process data logging and remote diagnostics.
Compact structure with modular layout allows easy maintenance and integration into existing sputtering systems.
This high-power DC supply is ideal for various thin-film deposition applications, including:
Semiconductor manufacturing – metal and dielectric film deposition
Optical coatings – high-uniformity thin films for lenses and filters
MEMS fabrication – sputtering of gold, titanium, or aluminum layers
Surface engineering – coatings for wear, corrosion, or conductivity
Scientific research – materials science and nanotechnology laboratories
Compatible with CoaterFilm magnetron sputtering coaters and custom vacuum systems.
Mounting Options: Standard 19" rack or custom cabinet
Power Input: AC 380V ±10%, three-phase, 50/60Hz
Connection Interface: Plug-and-play with standard sputtering cathodes
Cooling: Forced air or water circulation; ensure proper ventilation
Environment: Operating temperature 0–40°C, humidity ≤80%
Follow the user manual for grounding and shielding to prevent electrical noise interference.
Ensure all connections are properly grounded before operation.
Gradually increase output power to reach the required coating level.
Periodically check cables, fans, and water cooling lines.
Clean the power unit exterior and ensure unobstructed airflow.
In case of fault or alarm, refer to the troubleshooting guide or contact technical support.
Models range from 3 kW up to 60 kW, depending on your sputtering system requirements.
Yes, optional modules allow for pulsed DC operation for advanced thin-film applications.
Over-current, over-voltage, over-temperature, and short-circuit protection are all standard.
Yes, CoaterFilm offers custom voltage, current, and communication interface configurations.
Standard warranty is 12 months, with lifetime technical support available.
Over 15 years of experience in sputtering and vacuum coating systems
High reliability and proven performance in global research institutions
Professional technical team for custom design and on-site support
Fast delivery and flexible OEM/ODM service
ISO-certified production and quality assurance
CoaterFilm is your trusted partner for precision thin-film equipment and power solutions.
XYZ University Materials Lab – 10 kW DC supply integrated with dual-cathode sputtering coater, improved deposition rate by 25%.
OptoTech Inc. – High-power 40 kW unit used in optical coating line, 24/7 operation with zero failure in 18 months.
(More application cases available upon request.)
Warranty: 12 months standard coverage
Technical Support: 24/7 email assistance and remote diagnostics
Spare Parts: In-stock components for fast replacement
Manuals & Resources: Download detailed datasheets and operation manuals
CoaterFilm Vacuum Technology Co., Ltd.
Leading manufacturer of vacuum coating equipment and sputtering systems.
ISO 9001 certified, CE-approved power supply series.
