Features
| High field strength and uniform field profile achieved via use of electromagnetic finite element calculations in the design of the permanent magnetic assembly Low impedance sputtering head and standard RF connector easily match and interface with a wide range of DC and RF sputtering power supplies. Easy installation with common tools. Magnets are isolated from cooling water with a protective coating against corrosion to maximize durability.
1" Copper Backing Plate (EQ-CBP-1) is included.
The sputtering source is bakeable up to 200°C Standard ¾” OD Shaft Accepts 1/8” (3 mm) thick targets; 1 piece of the copper target is included as a standard accessory
|
Sputtering Gun | Sputtering Head Diameter: 1.82" (46.3mm) Target Diameter: 1.0 ± 0.02" (25.4mm) Maximum Target Thickness: 1/8" (3mm) Magnets: NdFeB Rare Earth Magnet Shaft Diameter: 3/4" O.D. |
Electrical Connector
| |
Power Requirement | DC (Max.) 250 W RF (Max.) 100 W |
Cathode Sputtering Current | 3 Amp (Max.)
|
Cathode Sputtering Voltage | 200 - 1,000 V |
Operating Pressure Range | ~1 mTorr to 1 Torr |
Sputtering Thickness
Uniformity Curve
 | NOTE: The Normalized Film Thickness graph above was obtained from depositing a ~200-nm thick film with a PVD HV Magnetron sputtering gun using a 1-inch Cu target. Measurements were performed using a 4-point probe in two mutually perpendicular directions (X, Y) across the wafer surface. The film was deposited onto an oxidized non-rotating Si wafer under the following conditions: |
Water Cooling (Required)
| Flow Rate requirement: 1/2 GPM, filtered
Water Inlet Temperature: <20 C Water hook up: 0.25" O.D Tube. Please inform us the tube size of your water chiller, we can pre-install the fitting for you at extra cost. |
Electrical & Mounting Fittings | Electrical Connector: Standard HN type (DC and RF) High Vacuum Quick Connector is pre-installed for immediate use, which can install the sputtering source onto the baseplate (up to 1” thick) of a vacuum chamber with 1” diameter through-hole easily. |
Vacuum Flange with Feedthrough (Optional) | 6" CF flange with a high vacuum feedthrough is available upon request at extra cost. The sputtering head can be easily installed on the 6'' CF vacuum flange through the quick disconnector. The height position of the sputtering gun can be manually adjusted inside the vacuum chamber.
|
Plasma sputtering target | |
Overall Length | 14 inches |
Net Weight | 3 lbs |
Optional Accessories
| Digital Temperature Controlled Recirculating Water Chiller with 6 Liters Tank, 16L / min Flow is available at extra cost, please order separately, click the pic below left to order. MTI offers DC and RF power source as well as vacuum chamber for DIY sputtering system ( click Pic below to order ) |
